Engineers develop first deep-UV microLED display chips for maskless photolithography

In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of the Hong Kong University of Science and Technology (HKUST) has developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines. This enhanced efficiency UVC microLED has showcased the viability of a lowered cost maskless photolithography through the provision of adequate light output power density, enabling exposure of photoresist films in a shorter time.